| Features |
|
Benefits |
| Process interruption times drastically reduced |
|
Less scrap and defects
Increased process stability and higher sputter rates
Cost savings (no filter) |
| System easy adjustable |
|
Easy and fast configuration |
ARC-parameter adjustable collectively:
Basis Mode => collective
Expert Mode => detailed |
|
Easy and coherent configuration. If needed, in-depth parameter setting available |
| Residual energy reduced drastically |
|
Less scrap and defects
Increased target lifetime |
| Protected against noise from the plasma |
|
Full performance even in critical processes |
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