The DC generator MP generates the necessary output for sputter applications. Equipped with a cutting-edge arc management it allows for high-quality coating. The generator’s output ranges from 1 to 240 kilowatts (kW). RMP facilitates uni and bipolar pulsed DC outputs. The settings for the on/off switch times are flexibly adjustable. The innovative power generator offers output power of 5 kW to 300 kW. With its HMP line, HÜTTINGER will exhibit the world’s only commercially available system for high power impulse magnetron sputters (HIPIMS). HIPIMS is the newest development in PVD pulse sputter technology. It facilitates high plasma densities with a high ionization level and high ion flux density. All product lines have data interfaces such as RS 232, RS 485, Profibus and a classic analog/digital interface. Other options are available.
Faster than a lightning strike: DC generator MP
The HÜTTINGER DC generator MP can be used wherever sophisticated DC sputter processes are required. Such processes include the manufacture of solar cells, semiconductors and flat panel displays, but also decorative and optical coatings. Aside from a high output density, the MP is impressive due to its arc management system that is the most advanced on the market. Users thus achieve high quality, smooth coatings with an increased yield of coating material (target). This is because MP’s arc detection identifies occuring flashovers and reacts appropriately. MP thus reduces target damages and minimizes coating defects. Its arc management system also masters heavy arcing environments. Thanks to MP, optimal coating characteristics can be achieved even in short deposition, for example, DVD manufacturing. HÜTTINGER MP covers an output range of 1 kW to 240 kW. At rated power, its output voltages range from 400 volts (V) to 800 V. For plasma ignition, MP reaches values of 1500 V. Available data interfaces include RS 232, RS 485, Profibus and a classic analog/digital interface. Other options are available. The MP comes in a 19" design with user interface either on front or back.
RMP: flexible in each half wave
With eight different modes for system configuration, the HÜTTINGER RMP offers the highest flexibility for DC sputter processes with dual or planar magnetrons. The featured settings range from simple DC to bipolar pulsed half waves. The latter are even individually adjustable with regard to the step size and interval duration. This means that the RMP is able to run numerous process steps with only one generator. Thus, eliminating setup and configuration times. In bipolar mode, each positive or negative rectangular half wave can be adjusted independently of the other. Different materials can be sputtered depending on their individual plasma conditions. Better process conditions and a higher yield of target materials are the result. Cutting-edge arc management prevents the emergence of electrical flashovers and thus paves the way to optimal coating qualities. The RMP product family comes in outputs of 5 kW to 200 kW. Its available data interfaces include RS 232, RS 485, Profibus and a classic analog/digital interface. Other options are available. The RMP comes in a 19" design with the control panel on the front or the back side.
HMP: high impulse, impressive result
The HMP from HÜTTINGER is the only commercially available system for high power impulse magnetron sputters (HIPIMS) worldwide. HIPIMS is the newest development in PVD pulse sputter technology. It facilitates high plasma densities with a high level of ionization and high ion flux density. This occurs through short pulses with very high outputs of up to 18 megawatts. Application areas include hard coating and semiconductor production. For the latter, trench filling in particuliar. "Trench filling" is a coating method that involves heavily accelerated particles precisely striking the grooves or "trenches" to be coated. The HÜTTINGER HMP generates the necessary output for the process. The HMP consists of three components: One DC power unit, a pulse generator and a matching device. The HMP is available with 10 kW and 20 kW outputs (average values). Its pulse peaks reach up to 18 megawatts and associated currents of 6 kiloamperes and a peak voltage of 3 kilovolts. Available data interfaces include RS 232, RS 485, Profibus and a classic analog/digital interface. Other options are available. The HMP comes in a 19" design with the control panel on the front or the back side.
