HUETTINGER Elektronik GmbH + Co. KG, in Freiburg, Germany, recently delivered the 10,000th IS RF generator on May 13, 2004, to TRUMPF Laser- und Systemtechnik GmbH in Ditzingen, Germany. These RF generators excite the TRUMPF TLF CO2 lasers and are a component in laser machines used for production engineering.
The total power of the 10,000 delivered generators exceeds 200 megawatts. Only half of these generators would be sufficient to provide light for all the major European football league stadiums. The IS RF generators are available with output values ranging from 7.5 to 44 kW at a frequency of 13.56 MHz.
"HUETTINGER generators are a very important part of our laser systems. With these high-quality, tried-and-true generators we can offer our customers an excellent total solution from a single source. Because HUETTINGER is committed to fast and flexible delivery, we are able to react immediately to peak order volumes," says Hans-Jochen Beilke, Managing Director of Sales and Marketing for the TRUMPF Group.
CO2 laser excitation: a physical plasma process
When solid matter is heated, it becomes a liquid and then a gas. If additional thermal energy is added to the hot gas, the thermal kinetic energy of the gas particles becomes so intense that electrons are released from the atoms or molecules as a result of collisions (ionization). The result is a plasma.
Stated simply, CO2 laser excitation is nothing more than the use of plasma excitation. Radio frequency (RF) generators excite a CO2 gas mixture. This stimulates the electrons of the gas molecules to release photons. The concentrated energy becomes the laser beam, which can easily cut through sheet metal half an inch thick.
Light as a universal tool
The laser is a universal tool used for cutting, welding, marking and many other applications. It works without contact and is not subject to wear. There are many advantages to using the laser for material processing in a wide variety of applications. The most important ones are often superior flexibility, processing speed and quality, as well as the streamlining of the overall process chain.
Our product range does not end with the laser
"As before, the RF generators continue to supply the production processes with the required energy. These include the deposition of thin layers and the etching of structures. Both using plasma. These processes are mostly used in the manufacture of semiconductors,“ explains HUETTINGER Managing Director Dr. Dieter Pauschinger. The knowledge gleaned from plasma excitation was the starting point for the development of today's IS generators.
HUETTINGER RF generators are increasingly being used in the production of flat screens. Considered in terms of a diagram, a flat screen is a giant transistor matrix. The structures used for this are created by means of plasma etching and Plasma Enhanced Chemical Vapor Deposition (PECVD). A highly reliable and stable power supply ensures superior results.
The physical dimensions of flat screens are becoming larger and larger. High power output is needed to produce these screens while maintaining the high level of quality. "Our IS generators deliver this power. Reliably and safely. And our customers know that they are purchasing a high-quality generator that has proven itself thousands of times. This important milestone is a testament to the fact that we produce and deliver these generators quickly and in large quantities," says Jürgen Mertens, Vice President Global Sales at HUETTINGER.
Superior customer care with on-site service
IS generators are used today around the world. This represents a special challenge for customer service. HUETTINGER has world-wide service and sales offices. This allows the company to provide customer service on-site and to make service calls with a rapid response time.
For photographs in digital form, please contact:
Ansgar Meermann, Press and Public Relations
Phone: +49-(0) 761 8971-126
Fax: +49-(0) 761 8971-150
E-mail: Ansgar.Meermann@de.huettinger.com